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Proceedings Paper

Mask industry assessment: 2005
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Paper Abstract

Microelectronics industry leaders routinely name mask cost and cycle time as top issues of concern. A survey was created with support from International SEMATECH (ISMT) and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of mask technologists from semiconductor manufacturers, merchant mask suppliers, and makers of equipment for mask fabrication. This year's assessment is the fourth in the current series of annual reports and is intended to be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of the mask industry. This report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results may be used to guide future investments on critical path issues. This year's survey contains all of the 2004 survey questions to provide an ongoing database. Additional questions were added to the survey covering operating cost factors and equipment utilization. Questions are grouped into categories: general business profile information, data processing, yields and yield loss mechanisms, delivery times, returns and services, operating cost factors and equipment utilization. Within each category are a many questions that create a detailed profile of both the business and technical status of the mask industry. This assessment includes inputs from eight major global merchant and captive mask manufacturers whose revenue represents approximately 85% of the global mask market. This participation rate is reduced by one captive from 2004. Note: Toppan, DuPont Photomasks Inc and AMTC (new) were consolidated into one input therefore the 2004 and 2005 surveys are basically equivalent.

Paper Details

Date Published: 4 November 2005
PDF: 11 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599202 (4 November 2005); doi: 10.1117/12.613333
Show Author Affiliations
Gilbert Shelden, Shelden Consulting (United States)
Scott Hector, Freescale Semiconductor (United States)


Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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