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Proceedings Paper

Non-destructive optical system based on digital holographic microscope for quasi real-time characterization of micromechanical shunt switch
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Paper Abstract

A digital holographic microscope (DHM) is employed as non-invasive metrological tool for inspection and characterization of a micromechanical shunt switches in coplanar waveguide configuration (CPW) for microwave applications. The switch is based on a bridge that can be actuated by using electrodes positioned laterally with respect to the central conductor of the CPW. The DHM features, such as speed, contact-less and non-destructivity, have allowed a full characterization of an electrical actuated shunt switches. In particular, the out-of-plane deformation of the bridge due to the applied voltage has been investigated with high accuracy. DHM inspection allows to investigate the shape of the bridge during the actuation, the total warpage due to the actuation, possible residual gap, possible hysteresis, and so on. These characterizations have been carried out both in static and in dynamic condition. In full paper the complete characterization will be reported together with an accurate description of the optical system employed for the investigation.

Paper Details

Date Published: 26 August 2005
PDF: 9 pages
Proc. SPIE 5858, Nano- and Micro-Metrology, 585815 (26 August 2005); doi: 10.1117/12.612746
Show Author Affiliations
Valerio Striano, Istituto per la Microelettronica e Microsistemi (Italy)
Giuseppe Coppola, Istituto per la Microelettronica e Microsistemi (Italy)
Pietro Ferraro, Istituto Nazionale di Ottica Applicata (Italy)
Domenico Alfieri, Istituto Nazionale di Ottica Applicata (Italy)
Sergio De Nicola, Istituto di Cibernetica del CNR (Italy)
Andrea Finizio, Istituto di Cibernetica del CNR (Italy)
Giovanni Pierattini, Istituto di Cibernetica del CNR (Italy)
Romolo Marcelli, Istituto per la Microelettronica e Microsistemi (Italy)
Paolo Mezzanotte, Univ. degli Studi di Perugia (Italy)


Published in SPIE Proceedings Vol. 5858:
Nano- and Micro-Metrology
Heidi Ottevaere; Peter DeWolf; Diederik S. Wiersma, Editor(s)

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