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Proceedings Paper

Dispersive white-light interferometry for thin-film thickness profile measurement
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Paper Abstract

We describes a new scheme of dispersive white-light interferometer that is capable of measuring the thickness profile of thin-film layers, for which not only the top surface height profile but also the film thickness of the target surface should be measured at the same time. The interferometer is found useful particularly for in-situ inspection of micro-engineered surfaces such as liquid crystal displays, which requires for high-speed implementation of 3-D surface metrology.

Paper Details

Date Published: 13 June 2005
PDF: 8 pages
Proc. SPIE 5856, Optical Measurement Systems for Industrial Inspection IV, (13 June 2005); doi: 10.1117/12.612076
Show Author Affiliations
Young-Sik Ghim, Korea Advanced Institute of Science and Technology (South Korea)
Seung-Woo Kim, Korea Advanced Institute of Science and Technology (South Korea)


Published in SPIE Proceedings Vol. 5856:
Optical Measurement Systems for Industrial Inspection IV
Wolfgang Osten; Christophe Gorecki; Erik L. Novak, Editor(s)

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