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Proceedings Paper

Focal spot measurement in ultra-intense ultra-short pulse laser facility
Author(s): Lanqin Liu; Hansheng Peng; Kainan Zhou; Xiaodong Wang; Xiaoming Zeng; Qihua Zhu; Xiaojun Huang; Xiaofeng Wei; Huan Ren
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Paper Abstract

A peak power of 286-TW Ti:sapphire laser facility referred to as SILEX-I was successfully built at China Academy of Engineering Physics, for a pulse duration of 30 fs in a three-stage Ti:sapphire amplifier chain based on chirped-pulse amplification. The beam have a wavefront distortion of 0.63μm PV and 0.09μm RMS, and the focal spot with an f/2.2 OAP is 5.7μm, to our knowledge, this is the best far field obtained for high-power ultra-short pulse laser systems with no deformable mirror wavefront correction. The peak focused intensity of ~1021W /cm2 were expected.

Paper Details

Date Published: 13 June 2005
PDF: 6 pages
Proc. SPIE 5856, Optical Measurement Systems for Industrial Inspection IV, (13 June 2005); doi: 10.1117/12.611993
Show Author Affiliations
Lanqin Liu, Laser Fusion Research Ctr., CAEP (China)
Hansheng Peng, Laser Fusion Research Ctr., CAEP (China)
Kainan Zhou, Laser Fusion Research Ctr., CAEP (China)
Xiaodong Wang, Laser Fusion Research Ctr., CAEP (China)
Xiaoming Zeng, Laser Fusion Research Ctr., CAEP (China)
Qihua Zhu, Laser Fusion Research Ctr., CAEP (China)
Xiaojun Huang, Laser Fusion Research Ctr., CAEP (China)
Xiaofeng Wei, Laser Fusion Research Ctr., CAEP (China)
Huan Ren, Laser Fusion Research Ctr., CAEP (China)


Published in SPIE Proceedings Vol. 5856:
Optical Measurement Systems for Industrial Inspection IV
Wolfgang Osten; Christophe Gorecki; Erik L. Novak, Editor(s)

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