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Proceedings Paper

Photo-etching of organic polymers using a laser plasma x-ray source based on a gas puff target irradiated with the PALS facility
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Paper Abstract

Experiments on direct photo-etching of organic polymers induced by high-intensity nanosecond pulses of soft X-ray radiation from a laser plasma X-ray source based on a gas puff target are presented. X-rays in the wavelength range from about 1 nm to 8 nm were produced by irradiation of the xenon/helium double-stream gas puff target with laser pulses from the Prague Asterix Laser System (PALS). The resulting X-ray pulses were used to irradiate samples from organic polymers and form microstructures. The results show relatively high efficiency of X-ray direct photo-etching that could be useful for micromachining of organic polymers.

Paper Details

Date Published: 23 March 2005
PDF: 4 pages
Proc. SPIE 5777, XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, (23 March 2005); doi: 10.1117/12.611333
Show Author Affiliations
Henryk Fiedorowicz, Military Univ. of Technology (Poland)
Andrzej Bartnik, Military Univ. of Technology (Poland)
Michal Bittner, Institute of Physics (Czech Republic)
Institute of Plasma Physics (Czech Republic)
Libor Juha, Institute of Physics (Czech Republic)
Institute of Plasma Physics (Czech Republic)
Josef Krasa, Institute of Physics (Czech Republic)
Institute of Plasma Physics (Czech Republic)
Pavel Kubat, Institute of Physics (Czech Republic)
Institute of Plasma Physics (Czech Republic)
Institute of Physical Chemistry (Czech Republic)
Janusz Mikolajczyk, Military Univ. of Technology (Poland)
Rafal Rakowski, Military Univ. of Technology (Poland)


Published in SPIE Proceedings Vol. 5777:
XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers
Jarmila Kodymova, Editor(s)

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