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Proceedings Paper

Thermo-correction of quasi-static optical distortions for EUV lithography
Author(s): Sergei Alexandrovich Dimakov; Boris Vladimirovich Kislitsyn; Sergei Ivanovich Klimentiev; Alexander P. Zhevlakov; Dmitrii Ivanovich Zhuk
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Paper Abstract

Now optical reducing systems for extreme ultraviolet projection lithography are being actively developed. Optical elements of these systems are required to be of super-high optical quality. For systems operating in the 13-nm wavelength range, their optical distortions should not exceed 1 nm in magnitude. Manufacturing of such elements with super-high optical quality requires large financial injections. In this report, we consider how to use thermal deformation of an optical element exposed to light for improvement of optical quality of the element. It is shown, in particular, that residual quasi-static large-scale (20% of diameter of the element) optical distortions, about 15 nm in magnitude, can be compensated with the proposed technique down to 0.5 nm (i.e. ≈ λ0/20 - λ0/30 for EUV).

Paper Details

Date Published: 12 April 2005
PDF: 10 pages
Proc. SPIE 5708, Laser Resonators and Beam Control VIII, (12 April 2005); doi: 10.1117/12.610993
Show Author Affiliations
Sergei Alexandrovich Dimakov, Research Institute for Laser Physics (Russia)
Boris Vladimirovich Kislitsyn, Research Institute for Laser Physics (Russia)
Sergei Ivanovich Klimentiev, Research Institute for Laser Physics (Russia)
Alexander P. Zhevlakov, Research Institute for Laser Physics (Russia)
Dmitrii Ivanovich Zhuk, Research Institute for Laser Physics (Russia)


Published in SPIE Proceedings Vol. 5708:
Laser Resonators and Beam Control VIII
Alexis V. Kudryashov; Alan H. Paxton, Editor(s)

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