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Proceedings Paper

20-nm linewidth nanoimprint mold prepared by selectively etched multilayer thin film
Author(s): Yongjun Zhang; Guanqi Han; Xinfan Huang; Wei Li; Xiping Hao; Guobin Ma; Kunji Chen
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Paper Abstract

A novel method to prepare nanomolds is reported, which is using multilayer thin-film deposition technique. A-Si/SiNx multilayer thin film is deposited on Si substrate in the conventional plasma enhanced chemical vapour deposition (PECVD) system. Then the relievo structure of alternative strips and grooves can be obtained on the cleaved cross-section of multilayer thin film by selective etching process. The strips of the etched sample have smooth and vertical sidewalls with small roughness. Due to the slow deposition rate, the thickness of the sublayer, therefore the size of the strips and grooves can be controlled on the nanometer scale by altering deposition time. The smallest width we get by now is the 20nm strips and 20nm grooves.

Paper Details

Date Published: 8 December 2004
PDF: 4 pages
Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); doi: 10.1117/12.608169
Show Author Affiliations
Yongjun Zhang, Nanjing Univ. (China)
JiLin Normal Univ. (China)
Guanqi Han, Nanjing Univ. (China)
Xinfan Huang, Nanjing Univ. (China)
Wei Li, Nanjing Univ. (China)
Xiping Hao, Nanjing Univ. (China)
Guobin Ma, Nanjing Univ. (China)
Kunji Chen, Nanjing Univ. (China)


Published in SPIE Proceedings Vol. 5774:
Fifth International Conference on Thin Film Physics and Applications
Junhao Chu; Zongsheng Lai; Lianwei Wang; Shaohui Xu, Editor(s)

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