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Proceedings Paper

Deposition of microcrystalline silicon thin films for solar cells by VHF-PECVD
Author(s): Xiaodan Zhang; Ying Zhao; Feng Zhu; Yaohua Mai; Changchun Wei; Yantao Gao; Guofu Hou; Jian Sun; Juan Li; Xinhua Geng; Shaozhen Xiong
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Paper Abstract

Intrinsic microcrystalline silicon has been deposited by very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD) technique at different discharge powers and silane concentrations. The results of Raman evidently show that the transition of materials from amorphous to microcrystalline silicon with the discharge power from low to high. To fabricate microcrystalline silicon material, the lower SC needs lower power and the higher SC needs higher power. The results of photo thermal deflection (PDS) measurements also indicate that the high quality of microcrystalline silicon was fabricated because of the low 'sub-band’ absorption coefficient, which is generally associated with defect densities. In addition, the results of dark conductivity and photosensitivity also evidently proved that a number of high quality microcrystalline silicon could be deposited by the optimization of experimental parameters. The results of active energy also show that material deposited by us could be used to fabricate solar cells. Preliminary results on the devices are presented: efficiency of approximately 5.3% was reached for 1μm thick solar cells.

Paper Details

Date Published: 8 December 2004
PDF: 4 pages
Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); doi: 10.1117/12.608047
Show Author Affiliations
Xiaodan Zhang, Nankai Univ. (China)
Ying Zhao, Nankai Univ. (China)
Feng Zhu, Nankai Univ. (China)
Yaohua Mai, Nankai Univ. (China)
Changchun Wei, Nankai Univ. (China)
Yantao Gao, Nankai Univ. (China)
Guofu Hou, Nankai Univ. (China)
Jian Sun, Nankai Univ. (China)
Juan Li, Nankai Univ. (China)
Xinhua Geng, Nankai Univ. (China)
Shaozhen Xiong, Nankai Univ. (China)


Published in SPIE Proceedings Vol. 5774:
Fifth International Conference on Thin Film Physics and Applications
Junhao Chu; Zongsheng Lai; Lianwei Wang; Shaohui Xu, Editor(s)

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