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Proceedings Paper

ZrO2 thin films deposited on various LiB3O5 substrates by electron beam evaporation
Author(s): Tianya Tan; Jianbing Huang; Meiqiong Zhan; Guanglei Tian; Jianda Shao; Zhengxiu Fan
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Paper Abstract

ZrO2 thin films were deposited using an electron beam evaporation technique on two kinds of LiB3O5 (LBO) substrates having the surfaces prepared by cutting at specified crystalline orientations. The results tested by the spectrophotometer indicated that all films had optical anisotropy, which was attributed to the film microstructure with preferred orientation from GXRD (grazing X-ray diffraction) analysis. The film microstructure difference deposited on LBO substrates with different crystalline orientation resulted in film refractive index change, namely, the ZrO2 thin film with the m-(-212) preferred orientation had lower refractive index than that with the o-(130) preferred orientation.

Paper Details

Date Published: 8 December 2004
PDF: 4 pages
Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); doi: 10.1117/12.607801
Show Author Affiliations
Tianya Tan, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Jianbing Huang, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Meiqiong Zhan, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Guanglei Tian, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Jianda Shao, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Zhengxiu Fan, Shanghai Institute of Optics and Fine Mechanics, CAS (China)


Published in SPIE Proceedings Vol. 5774:
Fifth International Conference on Thin Film Physics and Applications
Junhao Chu; Zongsheng Lai; Lianwei Wang; Shaohui Xu, Editor(s)

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