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Proceedings Paper

Vanadium oxide thin films prepared by RF magnetron sputtering method
Author(s): Zhishuan Li; Suntao Wu; Jing Li; Donghui Guo; Fuchun Xu
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Paper Abstract

The vanadium oxide thin films were prepared by R.F. magnetron sputtering method under different deposition conditions. The microstructures of the samples have been investigated by XRD, XPS, and the Laser Scanning Confocal Microscope . By XRD and XPS, it was found that properly decreasing substrate temperature or increasing sputtering power, larger crystalline particle size and better crystalline orientation with V2O5 (001) after annealing can be gotten; Properly increasing substrate temperature or reducing sputtering power, the proportions of high valence vanadium oxides are increased. Based on our analyses, high-purity vanadium pentoxide films have been prepared by adjusting flux ratio of O2 and Ar, substrate temperature, and sputtering power.

Paper Details

Date Published: 8 December 2004
PDF: 4 pages
Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); doi: 10.1117/12.607548
Show Author Affiliations
Zhishuan Li, Xiamen Univ. (China)
Suntao Wu, Xiamen Univ. (China)
Jing Li, Xiamen Univ. (China)
Donghui Guo, Xiamen Univ. (China)
Fuchun Xu, Xiamen Univ. (China)


Published in SPIE Proceedings Vol. 5774:
Fifth International Conference on Thin Film Physics and Applications
Junhao Chu; Zongsheng Lai; Lianwei Wang; Shaohui Xu, Editor(s)

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