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Proceedings Paper

Theoretical analysis of atom focusing for nanostructure fabrication
Author(s): Xian Zhong Chen; Ting Wen Xing; Guo Bin Yu; Xu Nan Chen; Han Min Yao
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Paper Abstract

The two-level atom focusing in a Gaussian standing wave laser field was analyzed from the perspective of both classical mechanics and wave mechanics. The effects of source imperfection such as velocity spread and beam spread on atom focusing were analyzed by numerically integrating the classical equation of atomic motion. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the standing wave laser field as a function of traveling distance. In the absence of source imperfection, the contribution of diffractive aberration originating from the wave nature of the atom to broadening of feature width is larger than that of spherical aberration. Several methods for improving atom lithography experiments were presented.

Paper Details

Date Published: 8 December 2004
PDF: 4 pages
Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); doi: 10.1117/12.607464
Show Author Affiliations
Xian Zhong Chen, Institute of Optics and Electronics, CAS (China)
Ting Wen Xing, Institute of Optics and Electronics, CAS (China)
Guo Bin Yu, Institute of Optics and Electronics, CAS (China)
Xu Nan Chen, Institute of Optics and Electronics, CAS (China)
Han Min Yao, Institute of Optics and Electronics, CAS (China)


Published in SPIE Proceedings Vol. 5774:
Fifth International Conference on Thin Film Physics and Applications
Junhao Chu; Zongsheng Lai; Lianwei Wang; Shaohui Xu, Editor(s)

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