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Proceedings Paper

Fabrication of nanometer sized features on non-flat substrates using a nano-imprint lithography process
Author(s): Mike Miller; Gary Doyle; Nick Stacey; Frank Xu; S. V. Sreenivasan; Mike Watts; Dwayne L. LaBrake
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Paper Abstract

The Step and Flash Imprint Lithography (S-FILTM) process is a step and repeat nano-imprint lithography (NIL) technique based on UV curable low viscosity liquids. Generally nano-imprint lithography (NIL) is a negative acting process which makes an exact replica of the imprint mold and is subsequently dry developed to reveal the underlying substrate material. The authors have demonstrated a novel imprint process, which reverses the tone of the imprint and enables dry develop on nonflat wafers with good critical dimension control and resist layer thickness. This positive acting NIL process termed SFIL/RTM (reverse tone S-FIL), enables nano-imprinting over intrinsic substrate topology of the type commonly found on single side polished substrates. This paper describes the SFIL/R process and the results of pattern transfer on single side polished silicon wafers.

Paper Details

Date Published: 6 May 2005
PDF: 9 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.607340
Show Author Affiliations
Mike Miller, Molecular Imprints, Inc. (United States)
Gary Doyle, Molecular Imprints, Inc. (United States)
Nick Stacey, Molecular Imprints, Inc. (United States)
Frank Xu, Molecular Imprints, Inc. (United States)
S. V. Sreenivasan, Molecular Imprints, Inc. (United States)
Mike Watts, Molecular Imprints, Inc. (United States)
Dwayne L. LaBrake, Molecular Imprints, Inc. (United States)

Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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