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Proceedings Paper

Metrologies for quantitative nanomechanical testing and quality control in semiconductor manufacturing
Author(s): Jon R. Pratt; John A. Kramar; David B. Newell; Douglas T. Smith
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Paper Abstract

If nanomechanical testing is to evolve into a tool for process and quality control in semiconductor fabrication, great advances in throughput, repeatability, and accuracy of the associated instruments and measurements will be required. A recent grant awarded by the NIST Advanced Technology Program seeks to address the throughput issue by developing a high-speed AFM-based platform for quantitative nanomechanical measurements. The following paper speaks to the issue of quantitative accuracy by presenting an overview of various standards and techniques under development at NIST and other national metrology institutes (NMIs) that can provide a metrological basis for nanomechanical testing. The infrastructure we describe places firm emphasis on traceability to the International System of Units, paving the way for truly quantitative, rather than qualitative, physical property testing.

Paper Details

Date Published: 10 May 2005
PDF: 12 pages
Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); doi: 10.1117/12.607339
Show Author Affiliations
Jon R. Pratt, National Institute of Standards and Technology (United States)
John A. Kramar, National Institute of Standards and Technology (United States)
David B. Newell, National Institute of Standards and Technology (United States)
Douglas T. Smith, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 5752:
Metrology, Inspection, and Process Control for Microlithography XIX
Richard M. Silver, Editor(s)

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