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Proceedings Paper

Influences of post-deposition annealing on the properties of the ZrO2 thin films prepared by electron beam evaporation
Author(s): S. Y. Shao; Jian Da Shao; D. P. Zhang; J. B. Huang; Zheng Xiu Fan
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Paper Abstract

The ZrO2 thin films were deposited on BK7 glass substrates by electron beam evaporation method at room temperature. The influences of post-deposition annealing between 200°C and 400°C on the structural and mechanical properties of the films have been investigated by X-ray diffraction and atomic force microscopy. It was found that a monoclinic phase formed at lower temperature of 200°C. With the increase of the annealing temperature, the tetragonal phase appeared. The stress in ZrO2 films showed a transition from tensile to compressive which could be explained as the evolution of the microstructure as function of annealing temperatures. At the same time, the refractive index of the ZrO2 films increased with the increasing of annealing temperatures, which may be ascribed to the microstructure densification of the ZrO2 films.

Paper Details

Date Published: 8 December 2004
PDF: 5 pages
Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); doi: 10.1117/12.607336
Show Author Affiliations
S. Y. Shao, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Jian Da Shao, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
D. P. Zhang, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
J. B. Huang, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Zheng Xiu Fan, Shanghai Institute of Optics and Fine Mechanics, CAS (China)


Published in SPIE Proceedings Vol. 5774:
Fifth International Conference on Thin Film Physics and Applications
Junhao Chu; Zongsheng Lai; Lianwei Wang; Shaohui Xu, Editor(s)

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