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Proceedings Paper

Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor
Author(s): Jian Zhang; Al Palaniappan; Xiaodi Su; Francis E. H. Tay
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Paper Abstract

Argon plasma is used to generate the mesoporous silica thin films from sol-gel-derived precursor. Poly(ethylene glycol)(PEG, MW=400) is employed as the template, i.e., the pore directing-agent as well as the binder. The influence of the plasma parameters on the mesoscopic properties of silica films are investigated by scanning electron microscopy (SEM), FTIR, low-angle X-ray scattering (SAXS), and nitrogen isotherm adsorption.

Paper Details

Date Published: 8 December 2004
PDF: 5 pages
Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); doi: 10.1117/12.607331
Show Author Affiliations
Jian Zhang, East China Normal Univ. (China)
Institute of Materials Research and Engineering (Singapore)
Al Palaniappan, Institute of Materials Research and Engineering (Singapore)
National Univ. of Singapore (Singapore)
Xiaodi Su, Institute of Materials Research and Engineering (Singapore)
Francis E. H. Tay, National Univ. of Singapore (Singapore)


Published in SPIE Proceedings Vol. 5774:
Fifth International Conference on Thin Film Physics and Applications
Junhao Chu; Zongsheng Lai; Lianwei Wang; Shaohui Xu, Editor(s)

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