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Proceedings Paper

Comparative study on Al-doped ZnO films sputtered with ceramics and metal targets
Author(s): Le-Xi Shao; Xiao-Ping Liu; Huey-Liang Hwang
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Paper Abstract

ZnO:Al thin films were deposited on glass and Si wafer substrates respectively by sputtering ceramics ZnO:Al2O3 and reactively sputtering metal Zn:Al targets for the purpose to find a suitable method for improving both conductivity and transparency of the film. The properties of the deposited films were investigated to determine the differences between the sputtered and reactive sputtered samples by using scanning electron microscopy (SEM), X-ray diffraction (XRD), energy dispersive X-ray analysis (EDX), UV-VIS spectrometer and electrical measurements. The results show that the films sputtered reactively with metal have a very high crystalline quality and transmittance in the visible light wave range, while the films sputtered with ceramics can obtain good conductivity and its crystalline structural quality can be improved largely by introducing oxygen into the deposition system.

Paper Details

Date Published: 8 December 2004
PDF: 4 pages
Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); doi: 10.1117/12.607274
Show Author Affiliations
Le-Xi Shao, Zhanjiang Normal College (China)
Xiao-Ping Liu, Zhanjiang Normal College (China)
Huey-Liang Hwang, National Tsing Hua Univ. (Taiwan)


Published in SPIE Proceedings Vol. 5774:
Fifth International Conference on Thin Film Physics and Applications
Junhao Chu; Zongsheng Lai; Lianwei Wang; Shaohui Xu, Editor(s)

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