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Proceedings Paper

Fabrication of magnetic nanostructures and devices by AFM nanolithography technique
Author(s): Yasushi Takemura; Jun-ichi Shirakashi
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Paper Abstract

Magnetic nanostructures and devices were fabricated by a combination of conventionally photo or electron beam lithography and atomic force microscopy (AFM) lithography. Ni- and Co(Fe)-based nanostructures of oxide were successfully fabricated by applying a negative pulse voltage to the AFM cantilever. Both of height and width of the oxide nanostructures were controlled by changing the applied bias voltage to the cantilever. Ni/Ni-oxide planar-type magnetic tunnel junctions were fabricated by this technique and the current-voltage curve exhibited a diode characteristic. It was also found that magnetic domain structures were controlled by the AFM nano-oxidation. This nanolithography is a promising technique for fabricating magnetic nanostructures for quantum devices and new functional materials.

Paper Details

Date Published: 8 December 2004
PDF: 6 pages
Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); doi: 10.1117/12.607266
Show Author Affiliations
Yasushi Takemura, Yokohama National Univ. (Japan)
Jun-ichi Shirakashi, Akita Prefectural Univ. (Japan)


Published in SPIE Proceedings Vol. 5774:
Fifth International Conference on Thin Film Physics and Applications
Junhao Chu; Zongsheng Lai; Lianwei Wang; Shaohui Xu, Editor(s)

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