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Proceedings Paper

CD reference features with sub-five nanometer uncertainty
Author(s): M. W. Cresswell; R. G. Dixson; W. F. Guthrie; R. A. Allen; C. E. Murabito; B. Park; J. V. Martinez de Pinillos; A. Hunt
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Paper Abstract

The implementation of a new test structure for HRTEM (High-Resolution Transmission Electron Microscopy) imaging, and the use of CD AFM (CD Atomic Force Microscopy) to serve as the transfer metrology, have resulted in reductions in the uncertainties attributed to critical dimension (CD) reference-material features, having calibrated CDs less than 100 nm. The previous generation of reference materials, which was field-tested in 2001, used electrical CD as the transfer metrology. Calibrated CD values were in the range 80 nm to 150 nm and expanded uncertainties were approximately ± 14 nm. The second-generation units, which have now been distributed to selected industry users for evaluation, have uncertainties as low as ±1.5 nm and calibrated CDs as low as 43 nm.

Paper Details

Date Published: 10 May 2005
PDF: 16 pages
Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); doi: 10.1117/12.606807
Show Author Affiliations
M. W. Cresswell, National Institute of Standards and Technology (United States)
R. G. Dixson, National Institute of Standards and Technology (United States)
W. F. Guthrie, National Institute of Standards and Technology (United States)
R. A. Allen, National Institute of Standards and Technology (United States)
C. E. Murabito, National Institute of Standards and Technology (United States)
B. Park, National Institute of Standards and Technology (United States)
J. V. Martinez de Pinillos, National Institute of Standards and Technology (United States)
A. Hunt, Accurel Systems International Corp. (United States)


Published in SPIE Proceedings Vol. 5752:
Metrology, Inspection, and Process Control for Microlithography XIX
Richard M. Silver, Editor(s)

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