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Proceedings Paper

High-resolution EUV imaging tools for resist exposure and aerial image monitoring
Author(s): M. Booth; O. Brisco; A. Brunton; J. Cashmore; P Elbourn; G. Elliner; M. Gower; J. Greuters; P. Grunewald; R. Gutierrez; T. Hill; J. Hirsch; L. Kling; N. McEntee; S. Mundair; P. Richards; V. Truffert; I. Wallhead; M. Whitfield; R. Hudyma
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Paper Abstract

Key features are presented of two high-resolution EUV imaging tools: the MS-13 Microstepper wafer exposure and the RIM-13 reticle imaging microscope. The MS-13 has been developed for EUV resist testing and technology evaluation at the 32nm node and beyond, while the RIM-13 is designed for actinic aerial image monitoring of blank and patterned EUV reticles. Details of the design architecture, module layout, major subsystems and performance are presented for both tools.

Paper Details

Date Published: 6 May 2005
PDF: 12 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.606715
Show Author Affiliations
M. Booth, Exitech Ltd. (United Kingdom)
O. Brisco, Exitech Ltd. (United Kingdom)
A. Brunton, Exitech Ltd. (United Kingdom)
J. Cashmore, Exitech Ltd. (United Kingdom)
P Elbourn, Exitech Ltd. (United Kingdom)
G. Elliner, Exitech Ltd. (United Kingdom)
M. Gower, Exitech Ltd. (United Kingdom)
J. Greuters, Exitech Ltd. (United Kingdom)
P. Grunewald, Exitech Ltd. (United Kingdom)
R. Gutierrez, Exitech Ltd. (United Kingdom)
T. Hill, Exitech Ltd. (United Kingdom)
J. Hirsch, Exitech Ltd. (United Kingdom)
L. Kling, Exitech Ltd. (United Kingdom)
N. McEntee, Exitech Ltd. (United Kingdom)
S. Mundair, Exitech Ltd. (United Kingdom)
P. Richards, Exitech Ltd. (United Kingdom)
V. Truffert, Exitech Ltd. (United Kingdom)
I. Wallhead, Exitech Ltd. (United Kingdom)
M. Whitfield, Exitech Ltd. (United Kingdom)
R. Hudyma, Paragon Optics Inc. (United States)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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