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Proceedings Paper

Influence of illumination tilt on imaging
Author(s): Mark C. Phillips; Steven D. Slonaker; Chris Treadway; Greg Darby
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Paper Abstract

Tilt in the optic axis of the illumination system with respect to the projection lens manifests itself as a shift of the illumination source intensity distribution in the pupil plane of that projection lens. The impact of this error category upon various types of patterns and among various imaging configurations is studied through image simulation as well as experiment. Issues addressed will include:-Methods of measuring illuminator tilt -Sensitivity of sample cases to illumination tilt, including pattern placement issues as well as pattern fidelity issues -Aberration influence and coupling with illumination tilt influences -Ramifications of illuminator tilt impacts. Finally, comments will be made regarding this error category as it may impact the increasingly stringent process complexities and reducing linewidth sizes required by the processes being developed for the near future.

Paper Details

Date Published: 12 May 2004
PDF: 12 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.606127
Show Author Affiliations
Mark C. Phillips, Intel Corp. (United States)
Steven D. Slonaker, Nikon Precision Inc. (United States)
Chris Treadway, Intel Corp. (United States)
Greg Darby, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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