Share Email Print
cover

Proceedings Paper

The impact of illumination on feature fidelity for CPL mask technology
Author(s): Jan Pieter Kuijten; Arjan Verhappen; Will Conley; Stephan van de Goor; Lloyd Litt; Wei Wu; Kevin Lucas; Bernie Roman; Bryan Kasprowicz; Chris Progler; Robert Socha; Doug van den Broeke; Kurt Wampler; Tom Laidig; Stephen Hsu
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Various types of line ends have been evaluated for either straight CPL mask or hybrid type builds. The authors will focus on image line end shortening and the impact of through dose and focus performance for very high NA ArF imaging. Simulations on test structures have been calculated along with in photoresist simulations to predict the impact on process window capability. Test structures have been designed and fabricated into a functional test for evaluation. Process evaluations have been completed and exposure-defocus window calculated.

Paper Details

Date Published: 12 May 2004
PDF: 5 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.605481
Show Author Affiliations
Jan Pieter Kuijten, ASML (Netherlands)
Arjan Verhappen, ASML (Netherlands)
Will Conley, Freescale Semiconductor (United States)
Stephan van de Goor, ASML (Netherlands)
Lloyd Litt, Freescale Semiconductor (United States)
Wei Wu, Freescale Semiconductor (United States)
Kevin Lucas, Freescale Semiconductor (United States)
Bernie Roman, Freescale Semiconductor (United States)
Bryan Kasprowicz, Photronics (United States)
Chris Progler, Photronics (United States)
Robert Socha, ASML MaskTools (United States)
Doug van den Broeke, ASML MaskTools (United States)
Kurt Wampler, ASML MaskTools (United States)
Tom Laidig, ASML MaskTools (United States)
Stephen Hsu, ASML MaskTools (United States)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

© SPIE. Terms of Use
Back to Top