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Proceedings Paper

In-situ and ex-situ ellipsometric characterization for semiconductor technology (Invited Paper)
Author(s): John A. Woollam; Paul G. Snyder; H. Walter Yao; Blaine D. Johs
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Paper Details

Date Published: 1 July 1992
PDF: 12 pages
Proc. SPIE 1678, Spectroscopic Characterization Techniques for Semiconductor Technology IV, (1 July 1992); doi: 10.1117/12.60459
Show Author Affiliations
John A. Woollam, Univ. of Nebraska/Lincoln (United States)
Paul G. Snyder, Univ. of Nebraska/Lincoln (United States)
H. Walter Yao, Univ. of Nebraska/Lincoln (United States)
Blaine D. Johs, J.A. Woollam Co. (United States)


Published in SPIE Proceedings Vol. 1678:
Spectroscopic Characterization Techniques for Semiconductor Technology IV

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