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Proceedings Paper

Surface characterization and surface energy measurements on boron phosphide films prepared by PECVD
Author(s): Abraham Ogwu; Thomas Hellwig; Saul Doherty; David Haddow; Klaus-Peter Mollman; Frank Placido
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Paper Abstract

Boron phosphide films prepared by PECVD have been characterised as a function of phosphine flow rate during deposition. The films were characterised by x-ray photoelectron spectroscopy (XPS), Atomic force microscopy (AFM), Nano-indentation and Scanning electron microscopy. The effect of phosphine flow rate during deposition on the dispersive, polar and acid-base components of the surface energy of the films was investigated. The components of the surface energy were determined by the Owens-Wendt (OW) and the Van-Oss-Chaudhry-Good (VOCG) methods. Both the Lifshitz-Van der Waaals dispersive interaction and the electron donor/electron acceptor acid-base components were found to depend on the phosphine flow rate during film preparation. Our results indicate the potential of Boron Phosphide films for tribological and engineering applications beyond their current application as protective coatings for soft infra-red transmitting substrates.

Paper Details

Date Published: 18 May 2005
PDF: 7 pages
Proc. SPIE 5786, Window and Dome Technologies and Materials IX, (18 May 2005); doi: 10.1117/12.603327
Show Author Affiliations
Abraham Ogwu, Paisley Univ. (United Kingdom)
Thomas Hellwig, Paisley Univ. (United Kingdom)
Saul Doherty, Thales Optronics (United Kingdom)
David Haddow, Thales Optronics (United Kingdom)
Klaus-Peter Mollman, Brandenburg Univ. of Applied Sciences (Germany)
Frank Placido, Paisley Univ. (United Kingdom)

Published in SPIE Proceedings Vol. 5786:
Window and Dome Technologies and Materials IX
Randal W. Tustison, Editor(s)

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