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Proceedings Paper

A 157-nm immersion microstepper
Author(s): M. Switkes; T. M. Bloomstein; M. Rothschild; E. W. Arriola; T. H. Morrison
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Paper Abstract

We have designed and constructed a microstepper for 157 nm immersion lithography. The lens, designed and fabricated at Newport, provides a numerical aperture of 1.3 and a field size of 60 μm with immersion liquids of index n=1.38. Because of a lack of system interferometer, final alignment has been ongoing in the field using actuators incorporated into the lens design. Lithography down to 250 nm has been demonstrated but lens alignment has proved difficult. We are currently implementing an image monitoring system to provide real-time feedback on lens performance and to allow expedited alignment.

Paper Details

Date Published: 12 May 2004
PDF: 6 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.602585
Show Author Affiliations
M. Switkes, Lincoln Lab., Massachusetts Institute of Technology (United States)
T. M. Bloomstein, Lincoln Lab., Massachusetts Institute of Technology (United States)
M. Rothschild, Lincoln Lab., Massachusetts Institute of Technology (United States)
E. W. Arriola, Newport Corp. (United States)
T. H. Morrison, Newport Corp. (United States)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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