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Proceedings Paper

Laser technology for wafer dicing and microvia drilling for next generation wafers
Author(s): Richard F. Toftness; Adrian Boyle; David Gillen
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Paper Abstract

Laser micromaching systems are being used in mainstream high-volume semiconductor applications. Two of those processes, via drilling and thin wafer dicing, are discussed in this paper. Via drilling has been proven viable for forming through chip and blind vias. The inherent flexibility of the laser process makes it possible to control via depth, diameter and sidewall slope. As a mask-less process, laser via drilling can be cost affective and highly flexible in its application. Thin wafer dicing reduces the breakage and damage to thin silicon wafers. A new process has been developed that improves the die strength of laser singulated devices beyond that obtained using conventional sawing techniques.

Paper Details

Date Published: 12 April 2005
PDF: 13 pages
Proc. SPIE 5713, Photon Processing in Microelectronics and Photonics IV, (12 April 2005); doi: 10.1117/12.602033
Show Author Affiliations
Richard F. Toftness, Xsil USA (United States)
Adrian Boyle, Xsil Ltd. (Ireland)
David Gillen, Xsil Ltd. (Ireland)

Published in SPIE Proceedings Vol. 5713:
Photon Processing in Microelectronics and Photonics IV
Jim Fieret; David B. Geohegan; Friedrich G. Bachmann; Willem Hoving; Frank Träger; Peter R. Herman; Jan J. Dubowski; Tatsuo Okada; Kunihiko Washio; Yongfeng Lu; Craig B. Arnold, Editor(s)

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