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Proceedings Paper

Modeling of the atomic processes in the laser-plasma EUV sources
Author(s): A. Sasaki; K. Nishihara; F. Koike; K. Kagawa; H. Tanuma; A. Sunahara; K. Gamada; T. Nishikawa
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Paper Abstract

We develop an atomic model for the Xe and Sn plasmas based on the calculated atomic data for the theoretical investigatiion of the laser plasma EUV source. The wavelength and intensity of the emission lines of Xe8-16+ and Sn4-12+ are investigated, and the dominant charge state and emission channels for the radiation at 13.5 nm are identified. The emissivity and opacity at the collisional radiative equilibrium (CRE) are calculated, and their spectral properties are investigated with respect to the accuracy of the wavelength of major emission lines and the effect of satellite lines.

Paper Details

Date Published: 6 May 2005
PDF: 8 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.602029
Show Author Affiliations
A. Sasaki, Japan Atomic Energy Research Institute (Japan)
K. Nishihara, Institute of Laser Engineering, Osaka Univ. (Japan)
F. Koike, Kitasato Univ. (Japan)
K. Kagawa, Nara Women's Univ. (Japan)
H. Tanuma, Tokyo Metropolitan Univ. (Japan)
A. Sunahara, Institute for Laser Technology (Japan)
K. Gamada, Institute of Laser Engineering, Osaka Univ. (Japan)
T. Nishikawa, Okayama Univ. (Japan)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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