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Proceedings Paper

Characterization of ArF immersion process for production
Author(s): Jeng-Horng Chen; Li-Jui Chen; Tun-Ying Fang; Tzung-Chi Fu; Lin-Hung Shiu; Yao-Te Huang; Norman Chen; Da-Chun Oweyang; Ming-Che Wu; Shih-Che Wang; John C.H. Lin; Chun-Kuang Chen; Wei-Ming Chen; Tsai-Sheng Gau; Burn J. Lin; Richard Moerman; Wendy Gehoel-van Ansem; Eddy van der Heijden; Fred de Jong; Dorothe Oorschot; Herman Boom; Martin Hoogendorp; Christian Wagner; Bert Koek
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Paper Abstract

ArF immersion lithography is essential to extend optical lithography. In this study, we characterized the immersion process on production wafers. Key lithographic manufacturing parameters, overlay, CD uniformity, depth of focus (DOF), optical proximity effects (OPE), and defects are reported. Similar device electrical performance between the immersion and the dry wafers assures electrical compatibility with immersion lithography. The yield results on 90-nm Static Random Access Memory (SRAM) chips confirm doubling of DOF by immersion as expected. Poly images of the 65-nm node from a 0.85NA immersion scanner are also shown.

Paper Details

Date Published: 12 May 2004
PDF: 10 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.602025
Show Author Affiliations
Jeng-Horng Chen, TSMC Inc. (Taiwan)
Li-Jui Chen, TSMC Inc. (Taiwan)
Tun-Ying Fang, TSMC Inc. (Taiwan)
Tzung-Chi Fu, TSMC Inc. (Taiwan)
Lin-Hung Shiu, TSMC Inc. (Taiwan)
Yao-Te Huang, TSMC Inc. (Taiwan)
Norman Chen, TSMC Inc. (Taiwan)
Da-Chun Oweyang, TSMC Inc. (Taiwan)
Ming-Che Wu, TSMC Inc. (Taiwan)
Shih-Che Wang, TSMC Inc. (Taiwan)
John C.H. Lin, TSMC Inc. (Taiwan)
Chun-Kuang Chen, TSMC Inc. (Taiwan)
Wei-Ming Chen, TSMC Inc. (Taiwan)
Tsai-Sheng Gau, TSMC Inc. (Taiwan)
Burn J. Lin, TSMC Inc. (Taiwan)
Richard Moerman, ASML Inc. (Netherlands)
Wendy Gehoel-van Ansem, ASML Inc. (Netherlands)
Eddy van der Heijden, ASML Inc. (Netherlands)
Fred de Jong, ASML Inc. (Netherlands)
Dorothe Oorschot, ASML Inc. (Netherlands)
Herman Boom, ASML Inc. (Netherlands)
Martin Hoogendorp, ASML Inc. (Netherlands)
Christian Wagner, ASML Inc. (Netherlands)
Bert Koek, ASML Inc. (Netherlands)

Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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