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Proceedings Paper

High-power and high-repetition-rate EUV source based on Xe discharge-produced plasma
Author(s): Yusuke Teramoto; Hiroto Sato; Kazunori Bessho; Gohta Niimi; Takahiro Shirai; Daiki Yamatani; Tetsu Takemura; Toshio Yokota; Khokan C. Paul; Kiyoyuki Kabuki; Koji Miyauchi; Mitsuru Ikeuchi; Kazuaki Hotta; Masaki Yoshioka; Koichi Toyoda
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Paper Abstract

Discharge-produced plasma (DPP) based EUV source have been studied and developed at EUVA/Gotenba Branch. Among the several kinds of discharge scheme, a capillary Z-pinch has been employed in our source. An all-solid-state magnetic pulse compression (MPC) generator was used to create a Z-pinch plasma. Low inductance MPC generator provides a pulsed current with about 52 kA of peak amplitude and 120 ns of pulse duration, and allows 7-kHz operation. A water-cooled discharge head was coupled with the MPC generator. In order to evaluate the source performance, electrical energy input to the discharge, EUV radiation power, radiation spatial profile, plasma image and spectra were observed. In-band EUV power into usable solid angle obtained at 7 kHz was 93 W/2%BW. By using nested grazing-incidence collector, EUV power at intermediate focus obtained was 19 W/2%BW.

Paper Details

Date Published: 6 May 2005
PDF: 8 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.602021
Show Author Affiliations
Yusuke Teramoto, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroto Sato, Extreme Ultraviolet Lithography System Development Association (Japan)
Kazunori Bessho, Extreme Ultraviolet Lithography System Development Association (Japan)
Gohta Niimi, Extreme Ultraviolet Lithography System Development Association (Japan)
Takahiro Shirai, Extreme Ultraviolet Lithography System Development Association (Japan)
Daiki Yamatani, Extreme Ultraviolet Lithography System Development Association (Japan)
Tetsu Takemura, Extreme Ultraviolet Lithography System Development Association (Japan)
Toshio Yokota, Usho Inc. (Japan)
Khokan C. Paul, Ushio Inc. (Japan)
Kiyoyuki Kabuki, Extreme Ultraviolet Lithography System Development Association (Japan)
Koji Miyauchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Mitsuru Ikeuchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Kazuaki Hotta, Extreme Ultraviolet Lithography System Development Association (Japan)
Masaki Yoshioka, Extreme Ultraviolet Lithography System Development Association (Japan)
Koichi Toyoda, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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