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Proceedings Paper

Nano-imaging with compact extreme ultraviolet laser sources
Author(s): G. Vaschenko; F. Brizuela; C. Brewer; M. Grisham; Y. Wang; M. A. Larotonda; B. M. Luther; C. S. Menoni; M. Marconi; J. J. Rocca; W. L. Chao; J. A. Liddle; E. H. Anderson; D. T. Attwood; A. V. Vinogradov; I. A. Artioukov; Y. P. Pershyn; V. V. Kondratenko
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Paper Abstract

We report high resolution imaging results obtained utilizing small-scale extreme ultraviolet laser sources. A compact capillary-discharge pumped Ne-like Ar laser emitting at a wavelength of 46.9 nm was used to demonstrate imaging with nanometer-scale resolution in transmission and reflection modes. We exploited the large photon fluence of this short wavelength laser to obtain high-resolution images with exposure times as short as 1-10 seconds. Images with a spatial resolution better than 140 nm were obtained using the combination of a Sc/Si multilayer coated Schwarzschild condenser and free-standing objective zone plate. Preliminary results of imaging with a 13.9 nm extreme ultraviolet laser light are also discussed.

Paper Details

Date Published: 10 May 2005
PDF: 9 pages
Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); doi: 10.1117/12.601899
Show Author Affiliations
G. Vaschenko, Colorado State Univ. (United States)
F. Brizuela, Colorado State Univ. (United States)
C. Brewer, Colorado State Univ. (United States)
M. Grisham, Colorado State Univ. (United States)
Y. Wang, Colorado State Univ. (United States)
M. A. Larotonda, Colorado State Univ. (United States)
B. M. Luther, Colorado State Univ. (United States)
C. S. Menoni, Colorado State Univ. (United States)
M. Marconi, Colorado State Univ. (United States)
J. J. Rocca, Colorado State Univ. (United States)
W. L. Chao, Lawrence Berkeley National Lab. (United States)
J. A. Liddle, Lawrence Berkeley National Lab. (United States)
E. H. Anderson, Lawrence Berkeley National Lab. (United States)
D. T. Attwood, Lawrence Berkeley National Lab. (United States)
Univ. of California/Berkley (United States)
A. V. Vinogradov, P. N. Lebedev Physical Institute (Russia)
I. A. Artioukov, P. N. Lebedev Physical Institute (Russia)
Y. P. Pershyn, Kharkov National Technical Univ. (Ukraine)
V. V. Kondratenko, Kharkov National Technical Univ. (Ukraine)


Published in SPIE Proceedings Vol. 5752:
Metrology, Inspection, and Process Control for Microlithography XIX
Richard M. Silver, Editor(s)

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