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Proceedings Paper

Proximity matching for 193 nm scanner using scatterometry
Author(s): WenZhan Zhou; Jin Yu; James Lo; Johnson Liu; Henry Tjhin; Thaddeus G. Dziura
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Paper Abstract

In this paper, we evaluate several approaches for proximity matching on a 193nm scanner system such as image contrast tuning, illumination tuning and photoresist tuning. Both experimental and simulation studies are carried out to reveal the differences between approaches. We find that it is very important to determine the root cause of proximity mismatch before attempting proximity matching, and that spectroscopic scatterometry is an excellent tool for OPC tuning

Paper Details

Date Published: 12 May 2004
PDF: 11 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.601574
Show Author Affiliations
WenZhan Zhou, UMC Ltd. (Singapore)
Jin Yu, UMC Ltd. (Singapore)
James Lo, UMC Ltd. (Singapore)
Johnson Liu, UMC Ltd. (Singapore)
Henry Tjhin, KLA-Tencor Corp. (United States)
Thaddeus G. Dziura, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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