Share Email Print
cover

Proceedings Paper

Creating precise 3D microstructures using laser direct-write bimetallic thermal resist grayscale photomasks
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Previous research demonstrated Sn/In and Bi/In bimetallic thermal resists are promising new materials for direct-write analogue grayscale photomask processes. These materials turn transparent with increased laser exposure power and their optical density changes smoothly from 3 OD when unexposed to less than 0.22 OD when fully exposed. The transparency is the result of an oxidation process that is controllable with exposure to generate the grayscale levels in the photomask. In order to produce precise 3D structures in regular photoresists, the steps involved in microlithography must be quantified and examined. The lithographic process includes drawing 8-bit grayscale bitmap patterns, computer-aided laser writing photomasks on bimetallic films, and regular photoresist exposure using a mask-aligner. Compensation during the mask-writing process was necessary since the relationship between the optical density of the exposed bimetallic films and the laser writing power was not completely linear. In addition, the response of the photoresists to the mask exposure time was also a non-linear relationship. To investigate the resolution limit for Bi/In and Sn/In bimetallic thermal resists as a masking material, we used a modified form of interference lithography to expose and develop structures in Bi/In resists with widths that are less than 200 nm. As a result of the lithography, we were able to create structures in the Bi/In films that are up to 20 times smaller than previously obtained using the direct-write method.

Paper Details

Date Published: 12 April 2005
PDF: 12 pages
Proc. SPIE 5713, Photon Processing in Microelectronics and Photonics IV, (12 April 2005); doi: 10.1117/12.601545
Show Author Affiliations
Glenn H. Chapman, Simon Fraser Univ. (Canada)
James Dykes, Simon Fraser Univ. (Canada)
David Poon, Simon Fraser Univ. (Canada)
Chinheng Choo, Simon Fraser Univ. (Canada)
Jun Wang, Simon Fraser Univ. (Canada)
Jun Peng, Simon Fraser Univ. (Canada)
Yuqiang Tu, Simon Fraser Univ. (Canada)


Published in SPIE Proceedings Vol. 5713:
Photon Processing in Microelectronics and Photonics IV
Jim Fieret; David B. Geohegan; Friedrich G. Bachmann; Willem Hoving; Frank Träger; Peter R. Herman; Jan J. Dubowski; Tatsuo Okada; Kunihiko Washio; Yongfeng Lu; Craig B. Arnold, Editor(s)

© SPIE. Terms of Use
Back to Top