Share Email Print
cover

Proceedings Paper

Modeling the formation of photonic crystals by holographic lithography
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

An approach is introduced to accurately explore methods of fabricating photonic crystals formed by holographic lithography. Analytical background is given for synthesizing the exposure beam configuration to form the desired lattice. This is combined with a comprehensive model that can predict lattice distortions due to physics of the photolithography process. Simulations are compared to experimental results and to results obtained by conventional intensity threshold methods.

Paper Details

Date Published: 22 January 2005
PDF: 9 pages
Proc. SPIE 5720, Micromachining Technology for Micro-Optics and Nano-Optics III, (22 January 2005); doi: 10.1117/12.601186
Show Author Affiliations
Raymond C. Rumpf, College of Optics and Photonics, Univ. of Central Florida (United States)
Eric G. Johnson, College of Optics and Photonics, Univ. of Central Florida (United States)


Published in SPIE Proceedings Vol. 5720:
Micromachining Technology for Micro-Optics and Nano-Optics III
Eric G. Johnson; Gregory P. Nordin; Thomas J. Suleski, Editor(s)

© SPIE. Terms of Use
Back to Top