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Proceedings Paper

EUV source system development update: advancing along the path to HVM
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Paper Abstract

The EUV light source has been characterized as the top-priority critical issue facing the viability of EUV lithography. Cymer's extensive EUV source development efforts have focused both on the technical feasibility of various approaches as well as the critical issue of commercial feasibility to reach high volume manufacturing (HVM) requirements. We present a comprehensive summary of performance data from a state-of-the-art operational EUV source that thoroughly characterizes technical issues such as conversion efficiency, source material delivery, collector coatings, protection techniques and the path to higher and higher EUV power. Additionally, we present analysis of this performance data when compared to HVM requirements. Finally, we also briefly investigate the associated implications of the cost of consumables (COC) for a production EUV light source.

Paper Details

Date Published: 6 May 2005
PDF: 12 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.601052
Show Author Affiliations
D. W. Myers, Cymer, Inc. (United States)
I. V. Fomenkov, Cymer, Inc. (United States)
B. A. M. Hansson, Cymer, Inc. (United States)
B. C. Klene, Cymer, Inc. (United States)
D. C. Brandt, Cymer, Inc. (United States)

Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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