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Proceedings Paper

Characterization of electrostatically chucked EUVL mask blanks
Author(s): Rebekah K. Ligman; Emily Y. Shu; Pei-yang Yan
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Paper Abstract

The flatness of electrostatically chucked EUVL reticles was evaluated on two Zerodur bipolar coulombic electrostatic chucks (from Invax Technologies) of different thicknesses, which represent different chuck stiffness, different hardness of the dielectric material used for chuck surface, and different surface flatness finishing. A Zygo GPI interferometer was used to measure the flatness of the chucked reticles, freestanding reticles, and chuck surfaces. The chucked reticle flatness was impacted by the flatness and shape of the front and back sides of the reticle and that of the chuck. Chucked reticle dynamics during chucking and reticle hysterisis were observed. A stable operation range for the e-chucks was found. We also observed backside-particle-induced-out of plane distortion (OPD) on the chucked reticle in the experiments when Cu particles of height 1 to 3μm were placed between the chuck and the reticle backside.

Paper Details

Date Published: 6 May 2005
PDF: 11 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.601043
Show Author Affiliations
Rebekah K. Ligman, Intel Corp. (United States)
Univ. of Minnesota (United States)
Emily Y. Shu, Intel Corp. (United States)
Pei-yang Yan, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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