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Proceedings Paper

Electron-beam lithography for micro and nano-optical applications
Author(s): Daniel W. Wilson; Richard E. Muller; Pierre M. Echternach; Johan P. Backlund
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Paper Abstract

Direct-write electron-beam lithography has proven to be a powerful technique for fabricating a variety of micro and nano-optical devices. Binary E-beam lithography is the workhorse technique for fabricating optical devices that require complicated precision nano-scale features. We describe a bi-layer resist system and virtual-mark height measurement for improving the reliability of fabricating binary patterns. Analog E-beam lithography is a newer technique that has found significant application in the fabrication of diffractive optical elements. We describe our techniques for fabricating analog surface-relief profiles in E-beam resist, including a technique for overcoming the problem of resist heating. We also describe a multiple field size exposure scheme for suppression of diffraction orders produced field-stitch errors in blazed diffraction gratings on non-flat substrates.

Paper Details

Date Published: 22 January 2005
PDF: 10 pages
Proc. SPIE 5720, Micromachining Technology for Micro-Optics and Nano-Optics III, (22 January 2005); doi: 10.1117/12.600784
Show Author Affiliations
Daniel W. Wilson, Jet Propulsion Lab. (United States)
Richard E. Muller, Jet Propulsion Lab. (United States)
Pierre M. Echternach, Jet Propulsion Lab. (United States)
Johan P. Backlund, Jet Propulsion Lab. (United States)


Published in SPIE Proceedings Vol. 5720:
Micromachining Technology for Micro-Optics and Nano-Optics III
Eric G. Johnson; Gregory P. Nordin; Thomas J. Suleski, Editor(s)

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