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Proceedings Paper

Proof-of-concept tool development for projection mask-less lithography (PML2)
Author(s): Hans-Joachim Doering; Thomas Elster; Joachim Heinitz; Olaf Fortagne; Christoph Brandstaetter; Ernst Haugeneder; Stefan Eder-Kapl; Gertraud Lammer; Hans Loeschner; Klaus Reimer; Joerg Eichholz; Juergen Saniter
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Paper Abstract

Electron beam based Projection Mask-Less Lithography (PML2) is one of the promising candidates for small and medium volume device production for the 45nm technology node and beyond. The concept of the PML2 proof-of-concept tool, to be realized as part of the European MEDEA+ project T409, comprises a single electron optical column, a multi beam blanking device (programmable "Aperture Plate System") including high speed optical data path and a scanning 300mm wafer stage. More than 250.000 beams will be projected onto the wafer used for a highly redundant scanning stripe exposure process. A demonstrator chip of the Aperture Plate System is being manufactured with > 1000 apertures of 5μm x 5μm size using standard MST processes. Results as achieved with this demonstrator chip using a specifically designed e-beam test bench are shown. Furthermore, the realtime data transmission concept is discussed, showing that with the selected technology the required data rates for the PML2 proof-of-concept tool can be delivered, with extendibility beyond. Viability of the optical data pattern transfer to the Aperture Plate System is shown using a test setup of the parallel high-speed transmission lines.

Paper Details

Date Published: 6 May 2005
PDF: 11 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.600458
Show Author Affiliations
Hans-Joachim Doering, Leica Microsystems Lithography GmbH (Germany)
Thomas Elster, Leica Microsystems Lithography GmbH (Germany)
Joachim Heinitz, Leica Microsystems Lithography GmbH (Germany)
Olaf Fortagne, Leica Microsystems Lithography GmbH (Germany)
Christoph Brandstaetter, IMS Jena GmbH (Germany)
Ernst Haugeneder, IMS Jena GmbH (Germany)
Stefan Eder-Kapl, IMS Nanofabrication GmbH (Austria)
Gertraud Lammer, IMS Nanofabrication GmbH (Austria)
Hans Loeschner, IMS Nanofabrication GmbH (Austria)
Klaus Reimer, Fraunhofer Institute for Silicon Technology (Germany)
Joerg Eichholz, Fraunhofer Institute for Silicon Technology (Germany)
Juergen Saniter, Fraunhofer Institute for Telecommunications, Heinrich-Hertz-Institut (Germany)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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