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Proceedings Paper

Characterization of capped multilayer mirrors using XPS, AES, and SIMS
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Paper Abstract

The effect of extreme ultraviolet (EUV) exposure on the chemical states of ruthenium (Ru) capped multilayer mirrors (MLM) and Silicon (Si) capped MLM with increasing water pressure were investigated by using X-ray Photoelectron Spectroscopy (XPS). Also, The capability of analyzing carbon on the Ru capped MLM was investigated by using Auger Electron Spectroscopy (AES), XPS and Secondary Ion Mass Spectroscopy (SIMS). It was demonstrated that ruthenium oxide was produced on the surface by EUV exposure under water pressure more than 1x10-5 Pa. The dependency of oxidation on water pressure of the Ru capped MLM was not noticeable in comparison with the Si capped MLM, while Mo was not oxidized even under 1x10-3 Pa of water pressure. As for the analysis of carbon on Ru capped MLM, raising the precision of peak separation between carbon and Ru was required in AES and XPS and the investigation for quantification was needed in SIMS.

Paper Details

Date Published: 6 May 2005
PDF: 8 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.600452
Show Author Affiliations
Hiromitsu Takase, Extreme Ultraviolet Lithography System Development Association (Japan)
Yoshio Gomei, Extreme Ultraviolet Lithography System Development Association (Japan)
Shigeru Terashima, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroyuki Kondo, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Aoki, Extreme Ultraviolet Lithography System Development AssociationExtreme Ultraviolet Lithography System (Japan)
Shuichi Matsunari, Extreme Ultraviolet Lithography System Development Association (Japan)
Masahito Niibe, Univ. of Hyogo (Japan)
Yukinobu Kakutani, Univ. of Hyogo (Japan)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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