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Proceedings Paper

The fabrication process and characteristics of light loss free zero-space microlenses for CMOS image sensor
Author(s): Sang Uk Lee; Jeong Lyeol Park; Jae Sung Choi; Jeong Gun Lee
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Paper Abstract

We report a novel method to fabricate zero-space microlenses without light loss for CMOS image sensor. Classical microlenses for CMOS image sensor, adopted for achieving high quality images by providing appropriate propagation and collection of light onto photo diode, are typically formed by patterning and thermal flowing process of square type photo resist array sequentially. In that process, sufficient spaces between microlenses must be maintained to avoid merging by keeping an isolated microlens for in arrayed lenses during thermal flowing process. In order to remove the spaces between microlenses, we have developed a dual step patterning process in conjunction with optimal thermal flowing process developed for obtaining optimum microlens shape. The characteristics of zero-space microlenses without light loss were also demonstrated comparing with classical microlenses.

Paper Details

Date Published: 12 May 2004
PDF: 8 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.600383
Show Author Affiliations
Sang Uk Lee, MagnaChip Semiconductor, Ltd. (South Korea)
Jeong Lyeol Park, MagnaChip Semiconductor, Ltd. (South Korea)
Jae Sung Choi, MagnaChip Semiconductor, Ltd. (South Korea)
Jeong Gun Lee, MagnaChip Semiconductor, Ltd. (South Korea)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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