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Proceedings Paper

Magnetic field ion mitigation for EUV light sources
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Paper Abstract

Fast ions from laser-produced EUV plasma are expected to significantly damage the collector mirror, which is located near the plasma in a EUV light source. Ion sputtering of the multilayer structure may be the main damage mechanism but layer boundary mixing and surface roughness increase are also observed from a Xe plasma exposure experiment. The magnetic field ion mitigation technology was evaluated in order to extend the collector mirror lifetime. A coil pair that produces a maximum static magnetic field of 0.6 T on the coil axis was used for magnetic confinement of ions. Liquid Xe jets of 10 to 30 micron mater in diameter were used as a plasma target. Spatial distributions and energy distributions of ions were measured with Faraday cups and time-of-flight measurements respectively. The effectiveness of the magnetic field ion mitigation was evaluated by measuring the erosion rate with a quartz crystal microbalance. A significant decrease of the Faraday cup signal was monitored by applying a magnetic field of 0.6 T. Though target size dependence on magnetic field effectiveness was observed, measured erosion rate was reduced to less than 10% by applying 0.6-T magnetic field in the case of 10-micron mater Xe jet and 300-mJ Nd:YAG laser irradiation.

Paper Details

Date Published: 6 May 2005
PDF: 8 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.600360
Show Author Affiliations
Hiroshi Komori, Extreme Ultraviolet Lithography System Development Association (Japan)
Yousuke Imai, Extreme Ultraviolet Lithography System Development Association (Japan)
Georg Soumagne, Extreme Ultraviolet Lithography System Development Association (Japan)
Tamotsu Abe, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Suganuma, Extreme Ultraviolet Lithography System Development Association (Japan)
Akira Endo, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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