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Proceedings Paper

Three-dimensional measurement by tilting and moving objective lens in CD-SEM(III)
Author(s): K. Abe; Y. Tsuruga; S. Okada; T. Noma; H. Aoki; H. Fujii; H. Koike; A. Hamaguchi; Y. Yamazaki
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Paper Abstract

Necessity of nondestructive three-dimensional measurement methodology has increased. We propose three-dimensional measurement by CD-SEM with T-MOL (Tilting and Moving Objective Lens) electron optics system. We designed the new objective lens, and confirmed that the new electron optics system provides 3.0nm resolution at tilting angle of 10 degrees. Moreover, we developed the multi-matching technique based on the several stereographical tilted images. In this paper, we report the comparison between the new technique and the conventional one, as well as the technique’s capability using the actual semiconductor devices.

Paper Details

Date Published: 10 May 2005
PDF: 9 pages
Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); doi: 10.1117/12.600336
Show Author Affiliations
K. Abe, TOPCON Corp. (Japan)
Y. Tsuruga, TOPCON Corp. (Japan)
S. Okada, TOPCON Corp. (Japan)
T. Noma, TOPCON Corp. (Japan)
H. Aoki, TOPCON Corp. (Japan)
H. Fujii, TOPCON Corp. (Japan)
H. Koike, TOPCON Corp. (Japan)
A. Hamaguchi, Semiconductor Co., Toshiba Corp. (Japan)
Y. Yamazaki, Semiconductor Co., Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 5752:
Metrology, Inspection, and Process Control for Microlithography XIX
Richard M. Silver, Editor(s)

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