Share Email Print
cover

Proceedings Paper

Experimental comparison of absolute PDI and lateral shearing interferometer
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

We present the experimental results of EUVA Absolute Point Diffraction Interferometer (ABSPDI) and Lateral Shearing Interferometer (LSI) for at-wavelength characterization of the projection lens for use in extreme-ultraviolet lithography (EUVL). The attained repeatability of either type of the interferometers is within 0.04nmRMS. The experimental results have shown good consistency between the LSI and ABSPDI. The reasons for the residual differences have been analyzed and we believed it is mainly due to the CCD tilt effect in the experimental system. After the CCD tilt effect was removed, a better consistency below 0.33nm RMS has been achieved.

Paper Details

Date Published: 10 May 2005
PDF: 8 pages
Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); doi: 10.1117/12.600274
Show Author Affiliations
Yucong Zhu, Extreme Ultraviolet Lithography System Development Association (Japan)
Katsumi Sugisaki, Extreme Ultraviolet Lithography System Development Association (Japan)
Masashi Okada, Extreme Ultraviolet Lithography System Development Association (Japan)
Katsura Otaki, Extreme Ultraviolet Lithography System Development Association (Japan)
Zhiqian Liu, Extreme Ultraviolet Lithography System Development Association (Japan)
Mikihiko Ishii, Extreme Ultraviolet Lithography System Development Association (Japan)
Jun Kawakami, Extreme Ultraviolet Lithography System Development Association (Japan)
Jun Saito, Extreme Ultraviolet Lithography System Development Association (Japan)
Katsuhiko Murakami, Extreme Ultraviolet Lithography System Development Association (Japan)
Chidane Ouchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Masanobu Hasegawa, Extreme Ultraviolet Lithography System Development Association (Japan)
Seima Kato, Extreme Ultraviolet Lithography System Development Association (Japan)
Takayuki Hasegawa, Extreme Ultraviolet Lithography System Development Association (Japan)
Akiyoshi Suzuki, Extreme Ultraviolet Lithography System Development Association (Japan)
Masahito Niibe, Univ. of Hyogo (Japan)


Published in SPIE Proceedings Vol. 5752:
Metrology, Inspection, and Process Control for Microlithography XIX
Richard M. Silver, Editor(s)

© SPIE. Terms of Use
Back to Top