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Proceedings Paper

Wavefront-based tool selection for critical level imaging
Author(s): Jacek K. Tyminski; John Lewellen
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Paper Abstract

IC manufacture often has to meet stringent requirements pushing the imaging tools beyond their limits. Selection and optimization of steppers used to image patterns with critical dimensions at a fraction of wavelength has to consider tool’s aberration residue and the imaging tradeoffs of the patterned features. This report presents methodology to select tool-specific, multi-feature optima for imaging tools performing beyond their design points.

Paper Details

Date Published: 12 May 2004
PDF: 9 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.600224
Show Author Affiliations
Jacek K. Tyminski, Nikon Precision Inc. (United States)
John Lewellen, Sigma-C (United States)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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