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Proceedings Paper

Study of key immersion lithography parameters and their relationship towards resolution and process latitude
Author(s): Karen Huang
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Date Published:
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Proc. SPIE 5754, Optical Microlithography XVIII, ; doi: 10.1117/12.600202
Show Author Affiliations
Karen Huang, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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