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Proceedings Paper

A novel focus monitoring method using double side chrome mask
Author(s): Yoshihiro Shiode; Hiroshi Morohoshi; Atsushi Takagi; Kohei Fujimaru; Kazushi Mizumoto; Yuki Takahashi
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Paper Abstract

In order to measure the focus control performance on exposure tools with high accuracy, we developed a novel focus monitoring method, entitled Z-SPIN. The features of this Z-SPIN method are the high resolution focus measurement accuracy of < 1nm and process robustness. We therefore began by quantitatively analyzing the issues exposure tools were having through the use of the Z-SPIN method. From this examination result, we demonstrate a robust focus control solution with Z-SPIN mask. In parallel, through the determination of the focus budget with the new focus control technique, a significant improvement of the focus performance on exposure tools is shown. Finally, by tightening focus control, we examined the viability of extending the lifetime of exposure tools as well as enabling device shrinking.

Paper Details

Date Published: 12 May 2004
PDF: 12 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.600170
Show Author Affiliations
Yoshihiro Shiode, Canon Inc. (Japan)
Hiroshi Morohoshi, Canon Inc. (Japan)
Atsushi Takagi, Canon Inc. (Japan)
Kohei Fujimaru, Canon Inc. (Japan)
Kazushi Mizumoto, Canon Inc. (Japan)
Yuki Takahashi, Canon Inc. (Japan)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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