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Proceedings Paper

Influence of material on process focus budget and process window of 80nm DRAM devices
Author(s): Sung Won Choi; SukJoo Lee; Jangho Shin; Sang-Gyun Woo; HanKu Cho; Joo-Tae Moon
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Paper Abstract

A new type of focus monitoring mask, multiple phase-phase shift mask (MP-PSM), has been designed, and the focus budget of a lithography process was investigated. MP-PSM was used to identity focus controllability of several scanners and was able to detect focus change smaller then 20 nm. We also investigated the difference in focus variation across a wafer between double side polished wafers and single side polished wafers. A comparative study of focus controllability of a scanner using 80 nm node DRAM pattern showed that the focus controllability of a scanner was directly affected by wafer type. Using double side polished wafers increased the process window.

Paper Details

Date Published: 10 May 2005
PDF: 8 pages
Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); doi: 10.1117/12.600166
Show Author Affiliations
Sung Won Choi, Samsung Electronics Co., Ltd. (South Korea)
SukJoo Lee, Samsung Electronics Co., Ltd. (South Korea)
Jangho Shin, Samsung Electronics Co., Ltd. (South Korea)
Sang-Gyun Woo, Samsung Electronics Co., Ltd. (South Korea)
HanKu Cho, Samsung Electronics Co., Ltd. (South Korea)
Joo-Tae Moon, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 5752:
Metrology, Inspection, and Process Control for Microlithography XIX
Richard M. Silver, Editor(s)

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