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Optimizing photomask patterns using rigorous inverse problem methodology for a full chip
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Proc. SPIE 5754, Optical Microlithography XVIII, ; doi: 10.1117/12.600160
Show Author Affiliations
Dan S. Abrams, Luminescent Technologies, Inc. (United States)
Linyong Pang, Luminescent Technologies, Inc. (United States)
Andrew J. Moore, Luminescent Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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