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Proceedings Paper

Characterization of flare on Intel’s EUV MET
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Paper Abstract

Measurements of flare as a function of feature size and orientation have been made on Intel's EUV Micro-Exposure Tool (MET). The predicted value for intrinsic flare from Mid-Spatial Frequency Roughness (MSFR) of mirror surfaces is 3.5%. After addition of the contribution to flare from figure error to that from MSFR, the modeled value is in excellent agreement to the measured flare for the 1 um line of 4.5%. The measured flare in the Horizontal (H) direction is 5% and is slightly higher than the flare in the Vertical (V) direction. Flare variation across the field is less than 1%.

Paper Details

Date Published: 6 May 2005
PDF: 8 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.600154
Show Author Affiliations
Sang Hun Lee, Intel Corp. (United States)
Manish Chandhok, Intel Corp. (United States)
Jeanette Roberts, Intel Corp. (United States)
Bryan J. Rice, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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