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Proceedings Paper

Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations
Author(s): Marylyn Hoy Bennett; Andrew Grenville; Scott D. Hector; Shane R. Palmer; Leonardus H. A. Leunissen; Vicky Philipsen; Theodore M. Bloomstein; Dennis E. Hardy; Mordechai Rothschild; James N. Hilfiker
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Paper Abstract

Polarization dependent diffraction efficiencies in transmission through gratings on specially designed masks with pitch comparable to the wavelength were measured using an angle-resolved scatterometry apparatus with a 193 nm excimer source. Four masks - two binary, one alternating and one attenuated phase shift mask - were included in the experimental measurements. The validity of models used in present commercially available simulation packages and additional polarization effects were evaluated against the experimental scattering efficiencies.

Paper Details

Date Published: 12 May 2005
PDF: 12 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); doi: 10.1117/12.600098
Show Author Affiliations
Marylyn Hoy Bennett, SEMATECH (United States)
Texas Instruments Inc. (United States)
Andrew Grenville, SEMATECH (United States)
Intel Corp. (United States)
Scott D. Hector, SEMATECH (United States)
Freescale Semiconductor, Inc. (United States)
Shane R. Palmer, SEMATECH (United States)
Texas Instruments Inc. (United States)
Leonardus H. A. Leunissen, IMEC (Belgium)
Vicky Philipsen, IMEC (Belgium)
Theodore M. Bloomstein, MIT Lincoln Lab. (United States)
Dennis E. Hardy, MIT Lincoln Lab. (United States)
Mordechai Rothschild, MIT Lincoln Lab. (United States)
James N. Hilfiker, Woollam Co., Inc. (United States)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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