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Characterization of collector optic material samples before and after exposure in LPP and DPP EUV sources
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Paper Abstract

The University of Illinois at Urbana-Champaign (UIUC) and several national laboratories are collaborating on an SEMATECH effort to characterize xenon plasma exposure effects on EUV condenser optics. A series of mirror samples provided by SEMATECH were exposed for 10M shots in an Xtreme Technologies XTS 13-35 commercial EUV discharge plasma source at UIUC and 5M at the high-power TRW laser plasma source at Sandia National Laboratories. Results for both pre and post-exposure material characterization are presented, for samples exposed in both facilities. Surface analysis performed by the Center for Microanalysis of Materials at UIUC investigates mirror degradation mechanisms by measuring changes in surface roughness, texture, and grain sizes as well as analysis of implantation of energetic Xe ions, Xe diffusion, and mixing of multilayers. Materials characterization on samples removed after varying exposure times in the XTS source, together with in-situ EUV reflectivity measurements, identify the onset of different degradation mechanisms within each sample over 1M-100M shots. Results for DPP-exposed samples for 10 million shots in our XCEED (Xtreme Commercial EUV Exposure Device) experiment showed, in general, that samples were eroded and the surfaces were roughened with little change to the texture. AFM results showed an increase in roughness by a factor of 2-5 times, with two exceptions. This was confirmed by x-ray reflectivity (XRR) data, which showed similar roughening characteristics and also confirmed the smoothening of two samples. SEM pictures showed that erosion was from 4-47 nm, depending on the sample material and angle of incidence for debris ions. Finally, microanalysis of the exposed samples indicated that electrode material was implanted at varying depths in the samples. The erosion mechanism is explored using a spherical sector energy analyzer (ESA) to measure ion species and their energy spectra. Energy spectra for ions derived from various chamber sources are measured as a function of the Argon flow rate and angle from the centerline of the pinch. Results show creation of high energy ions (up to E = 13 keV). Species noted include ions of Xe, the buffer gas, and various electrode materials. The bulk of fast ion ejection from the pinch includes Xe+ which maximizes at ~8 keV followed by Xe2+ which maximizes at ~5 keV. Data from samples analysis and ESA measurements combined indicate mechanism and effect for debris-optic interactions and detail the effectiveness of the current debris mitigation schemes.

Paper Details

Date Published: 6 May 2005
PDF: 12 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.600093
Show Author Affiliations
Huatan Qiu, Univ. of Illinois at Urbana-Champaign (United States)
Darren A. Alman, Univ. of Illinois at Urbana-Champaign (United States)
Keith C. Thompson, Univ. of Illinois at Urbana-Champaign (United States)
Matthew D. Coventry, Univ. of Illinois at Urbana-Champaign (United States)
Joshua B. Spencer, Univ. of Illinois at Urbana-Champaign (United States)
Matthew R. Hendricks, Univ. of Illinois at Urbana-Champaign (United States)
Erik L. Antonsen, Univ. of Illinois at Urbana-Champaign (United States)
Brian E. Jurczyk, Univ. of Illinois at Urbana-Champaign (United States)
David N. Ruzic, Univ. of Illinois at Urbana-Champaign (United States)
Tim P. Spila, Univ. of Illinois at Urbana-Champaign (United States)
Ginger Edwards, SEMATECH (United States)
Stefan Wurm, SEMATECH (United States)
Obert Wood, SEMATECH (United States)
Robert Bristol, Intel Components Research (United States)

Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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