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Proceedings Paper

Secondary RF plasma system for mitigation of EUV source debris and advanced fuels
Author(s): Michael A. Jaworski; Michael J. Williams; Erik L. Antonsen; Brian E. Jurczyk; David N. Ruzic; Robert Bristol
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Paper Abstract

A 52 MHz RF system has been installed and tested on the IDEAL chamber. The secondary plasma source will be used in conjunction with other methods to mitigate debris from an EUV source. The plasmas are produced by a quarter-wavelength helical resonator antenna contained within a faraday shield. Argon and helium gases have both been tested in the system and have been shown to produce plasmas with densities as high as 8 × 1011 cm-3 with input powers up to 800 W. Input power to the system is limited by internal geometry and connections to the antenna housing.

Paper Details

Date Published: 6 May 2005
PDF: 7 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.600059
Show Author Affiliations
Michael A. Jaworski, Univ. of Illinois at Urbana-Champaign (United States)
Michael J. Williams, Univ. of Illinois at Urbana-Champaign (United States)
Erik L. Antonsen, Univ. of Illinois at Urbana-Champaign (United States)
Brian E. Jurczyk, Univ. of Illinois at Urbana-Champaign (United States)
David N. Ruzic, Univ. of Illinois at Urbana-Champaign (United States)
Robert Bristol, Intel Components Research (United States)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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